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    Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers

    New search for: Graef, D.
    New search for: Lambert, U.
    New search for: Brohl, M.
    New search for: Ehlert, A.
    New search for: Wahlich, R.
    New search for: Wagner, P.

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    Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers

    New search for: Graef, D.
    New search for: Lambert, U.
    New search for: Brohl, M.
    New search for: Ehlert, A.
    New search for: Wahlich, R.
    New search for: Wagner, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers

    New search for: Graef, D.
    New search for: Lambert, U.
    New search for: Brohl, M.
    New search for: Ehlert, A.
    New search for: Wahlich, R.
    New search for: Wagner, P.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers

    Contributors:

    Graef, D. (author) / Lambert, U. (author) / Brohl, M. (author) / Ehlert, A. (author) / Wahlich, R. (author) / Wagner, P. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 50-54

    Publication date:

    1996-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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