Study of post-deposited contamination in low-temperature deposited polysilicon films: Fid-Bau Portal

Study of post-deposited contamination in low-temperature deposited polysilicon films

Bertomeu, J. / Puigdollers, J. / Peiro, D. / Cifre, J. / Delgado, J. C. / Andreu, J.

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Study of post-deposited contamination in low-temperature deposited polysilicon films

Bertomeu, J. / Puigdollers, J. / Peiro, D. / Cifre, J. / Delgado, J. C. / Andreu, J.

Study of post-deposited contamination in low-temperature deposited polysilicon films

Bertomeu, J. / Puigdollers, J. / Peiro, D. / Cifre, J. / Delgado, J. C. / Andreu, J.

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Check availability in my library

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Document information

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Document information

Title:

Study of post-deposited contamination in low-temperature deposited polysilicon films

Contributors:

Bertomeu, J. (author) / Puigdollers, J. (author) / Peiro, D. (author) / Cifre, J. (author) / Delgado, J. C. (author) / Andreu, J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 96-99

Publication date:

1996-01-01

Size:

4 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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