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    Silicon interstitials generation during the exposure of silicon to hydrogen plasma

    New search for: Tonini, R.
    New search for: Monelli, A.
    New search for: Corni, F.
    New search for: Frabboni, S.
    New search for: Ottaviani, G.
    New search for: Queirolo, G.

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    Silicon interstitials generation during the exposure of silicon to hydrogen plasma

    New search for: Tonini, R.
    New search for: Monelli, A.
    New search for: Corni, F.
    New search for: Frabboni, S.
    New search for: Ottaviani, G.
    New search for: Queirolo, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Silicon interstitials generation during the exposure of silicon to hydrogen plasma

    New search for: Tonini, R.
    New search for: Monelli, A.
    New search for: Corni, F.
    New search for: Frabboni, S.
    New search for: Ottaviani, G.
    New search for: Queirolo, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Silicon interstitials generation during the exposure of silicon to hydrogen plasma

    Contributors:

    Tonini, R. (author) / Monelli, A. (author) / Corni, F. (author) / Frabboni, S. (author) / Ottaviani, G. (author) / Queirolo, G. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 36 ; 158-161

    Publication date:

    1996-01-01

    Size:

    4 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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