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CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
Pfleging, W. (author) / Wesner, D. A. (author) / Kreutz, E. W. (author)
APPLIED SURFACE SCIENCE ; 96/98 ; 496-500
1996-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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