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CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
CCl~4-assisted CF~4 etching of silicon in a microwave-assisted LDE (laser dry etching)-process
Pfleging, W. (Autor:in) / Wesner, D. A. (Autor:in) / Kreutz, E. W. (Autor:in)
APPLIED SURFACE SCIENCE ; 96/98 ; 496-500
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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