Optical and electrical characterization of high quality �-FeSi~2 thin films grown by solid phase epitaxy: Fid-Bau Portal

Optical and electrical characterization of high quality -FeSi~2 thin films grown by solid phase epitaxy

Tassis, D. H. / Mitsas, C. L. / Zorba, T. T. / Angelakeris, M. / Dimitriadis, C. A. / Valassiades, O. / Siapkas, D. I. / Kiriakidis, G.

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Optical and electrical characterization of high quality -FeSi~2 thin films grown by solid phase epitaxy

Tassis, D. H. / Mitsas, C. L. / Zorba, T. T. / Angelakeris, M. / Dimitriadis, C. A. / Valassiades, O. / Siapkas, D. I. / Kiriakidis, G.

Optical and electrical characterization of high quality -FeSi~2 thin films grown by solid phase epitaxy

Tassis, D. H. / Mitsas, C. L. / Zorba, T. T. / Angelakeris, M. / Dimitriadis, C. A. / Valassiades, O. / Siapkas, D. I. / Kiriakidis, G.

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Document information

Title:

Optical and electrical characterization of high quality -FeSi~2 thin films grown by solid phase epitaxy

Contributors:

Tassis, D. H. (author) / Mitsas, C. L. (author) / Zorba, T. T. (author) / Angelakeris, M. (author) / Dimitriadis, C. A. (author) / Valassiades, O. (author) / Siapkas, D. I. (author) / Kiriakidis, G. (author)

Published in:

APPLIED SURFACE SCIENCE ; 102 ; 178-183

Publication date:

1996-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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