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Characterization of triazine derivatives on silicon wafers studied by photoelectron spectroscopy (XPS, UPS) and metastable impact electron spectroscopy (MIES)
Characterization of triazine derivatives on silicon wafers studied by photoelectron spectroscopy (XPS, UPS) and metastable impact electron spectroscopy (MIES)
Characterization of triazine derivatives on silicon wafers studied by photoelectron spectroscopy (XPS, UPS) and metastable impact electron spectroscopy (MIES)
Dieckhoff, S. (author) / Schlett, V. (author) / Possart, W. (author) / Hennemann, O.-D. (author) / Guenster, J. (author) / Kempter, V. (author)
APPLIED SURFACE SCIENCE ; 103 ; 221-229
1996-01-01
9 pages
Article (Journal)
English
DDC:
621.35
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