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Deep trench etching in silicon with fluorine containing plasmas
Deep trench etching in silicon with fluorine containing plasmas
Deep trench etching in silicon with fluorine containing plasmas
Mansano, R. D. (author) / Verdonck, P. (author) / Maciel, H. S. (author) / Feldman, L. C. / Nishizawa, J. / Van der Weg, W. F.
1996-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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