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Etching of SiC with Fluorine ECR Plasma
Etching of SiC with Fluorine ECR Plasma
Etching of SiC with Fluorine ECR Plasma
Forster, C. (author) / Cimalla, V. (author) / Kosiba, R. (author) / Ecke, G. (author) / Weih, P. (author) / Ambacher, O. (author) / Pezoldt, J. (author)
MATERIALS SCIENCE FORUM ; 457/460 ; 821-824
2004-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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