A platform for research: civil engineering, architecture and urbanism
Influence of physisorbed arsenic on RHEED intensity oscillations during low-temperature GaAs molecular beam epitaxy
Influence of physisorbed arsenic on RHEED intensity oscillations during low-temperature GaAs molecular beam epitaxy
Influence of physisorbed arsenic on RHEED intensity oscillations during low-temperature GaAs molecular beam epitaxy
Venkatasubramanian, R. (author) / Pamula, V. K. (author) / Dorsey, D. L. (author)
APPLIED SURFACE SCIENCE ; 104/105 ; 448-454
1996-01-01
7 pages
Article (Journal)
English
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
On the Mechanism of RHEED Oscillations in Molecular Beam Epitaxy of II-VI Compounds
British Library Online Contents | 1995
|RHEED intensity oscillation of C60 growth on GaAs substrates
British Library Online Contents | 2008
|British Library Online Contents | 2000
|RHEED reflex profile analysis and phase locked epitaxy of ZnSe on (001)-oriented GaAs
British Library Online Contents | 1994
|British Library Online Contents | 2004
|