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    Development of mechanical stress in sputtered Cr~3Si films during annealing

    New search for: Brueckner, W.
    New search for: Weise, G.
    New search for: Mattern, N.
    New search for: Reiss, G.

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    Development of mechanical stress in sputtered Cr~3Si films during annealing

    New search for: Brueckner, W.
    New search for: Weise, G.
    New search for: Mattern, N.
    New search for: Reiss, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Development of mechanical stress in sputtered Cr~3Si films during annealing

    New search for: Brueckner, W.
    New search for: Weise, G.
    New search for: Mattern, N.
    New search for: Reiss, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Development of mechanical stress in sputtered Cr~3Si films during annealing

    Contributors:

    Brueckner, W. (author) / Weise, G. (author) / Mattern, N. (author) / Reiss, G. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 15 ; 1935-1937

    Publication date:

    1996-01-01

    Size:

    3 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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