Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments: Fid-Bau Portal

Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments

Hong, J. / Lee, J. W. / Santana, C. J. / Abernathy, C. R. / Pearton, S. J. / Hobson, W. S. / Ren, F.

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Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments

Hong, J. / Lee, J. W. / Santana, C. J. / Abernathy, C. R. / Pearton, S. J. / Hobson, W. S. / Ren, F.

Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments

Hong, J. / Lee, J. W. / Santana, C. J. / Abernathy, C. R. / Pearton, S. J. / Hobson, W. S. / Ren, F.

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Check availability in my library

Order at Subito €

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Document information

Title:

Plasma etching of InGaP, AlInP and AlGaP in BCl~3 environments

Contributors:

Hong, J. (author) / Lee, J. W. (author) / Santana, C. J. (author) / Abernathy, C. R. (author) / Pearton, S. J. (author) / Hobson, W. S. (author) / Ren, F. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 41 ; 247-252

Publication date:

1996-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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