Nitridation of Al~2O~3 and GaAs surfaces by control enhanced ECR plasma: Fid-Bau Portal

Nitridation of Al~2O~3 and GaAs surfaces by control enhanced ECR plasma

Mutoh, H. / O'Keeffe, P. / Den, S. / Komuro, S. / Morikawa, T. / Park, Y. J. / Hara, K. / Munekata, H. / Kukimoto, H.

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Nitridation of Al~2O~3 and GaAs surfaces by control enhanced ECR plasma

Mutoh, H. / O'Keeffe, P. / Den, S. / Komuro, S. / Morikawa, T. / Park, Y. J. / Hara, K. / Munekata, H. / Kukimoto, H.

Nitridation of Al~2O~3 and GaAs surfaces by control enhanced ECR plasma

Mutoh, H. / O'Keeffe, P. / Den, S. / Komuro, S. / Morikawa, T. / Park, Y. J. / Hara, K. / Munekata, H. / Kukimoto, H.

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Document information

Title:

Nitridation of Al~2O~3 and GaAs surfaces by control enhanced ECR plasma

Contributors:

Mutoh, H. (author) / O'Keeffe, P. (author) / Den, S. (author) / Komuro, S. (author) / Morikawa, T. (author) / Park, Y. J. (author) / Hara, K. (author) / Munekata, H. (author) / Kukimoto, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 113/114 ; 622-626

Publication date:

1997-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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