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Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films
Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films
Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films
Teramoto, A. (author) / Kobayashi, K. (author) / Matsui, Y. (author) / Hirayama, M. (author)
APPLIED SURFACE SCIENCE ; 117/118 ; 245-248
1997-01-01
4 pages
Article (Journal)
English
DDC:
621.35
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