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Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films

Teramoto, A. / Kobayashi, K. / Matsui, Y. / Hirayama, M.

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Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films

Teramoto, A. / Kobayashi, K. / Matsui, Y. / Hirayama, M.

Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films

Teramoto, A. / Kobayashi, K. / Matsui, Y. / Hirayama, M.

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Order at Subito €

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Document information

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Document information

Title:

Dielectric breakdown caused by hole-induced-defect in thin SiO~2 films

Contributors:

Teramoto, A. (author) / Kobayashi, K. (author) / Matsui, Y. (author) / Hirayama, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 117/118 ; 245-248

Publication date:

1997-01-01

Size:

4 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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