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    FLASH memory data retention reliability and the floating gate/tunnel SiO~2 interface characteristics

    New search for: Kubota, T.
    New search for: Ando, K.
    New search for: Muramatsu, S.

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    FLASH memory data retention reliability and the floating gate/tunnel SiO~2 interface characteristics

    New search for: Kubota, T.
    New search for: Ando, K.
    New search for: Muramatsu, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    FLASH memory data retention reliability and the floating gate/tunnel SiO~2 interface characteristics

    New search for: Kubota, T.
    New search for: Ando, K.
    New search for: Muramatsu, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    FLASH memory data retention reliability and the floating gate/tunnel SiO~2 interface characteristics

    Contributors:

    Kubota, T. (author) / Ando, K. (author) / Muramatsu, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 117/118 ; 253-258

    Publication date:

    1997-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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