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    In-situ infrared reflective absorption spectroscopy characterization of SiN films deposited using sputtering-type ECR microwave plasma

    New search for: Liu, Y. C.
    New search for: Furukawa, K.
    New search for: Gao, D. W.
    New search for: Nakashima, H.
    New search for: Uchino, K.
    New search for: Muraoka, K.

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    In-situ infrared reflective absorption spectroscopy characterization of SiN films deposited using sputtering-type ECR microwave plasma

    New search for: Liu, Y. C.
    New search for: Furukawa, K.
    New search for: Gao, D. W.
    New search for: Nakashima, H.
    New search for: Uchino, K.
    New search for: Muraoka, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    In-situ infrared reflective absorption spectroscopy characterization of SiN films deposited using sputtering-type ECR microwave plasma

    New search for: Liu, Y. C.
    New search for: Furukawa, K.
    New search for: Gao, D. W.
    New search for: Nakashima, H.
    New search for: Uchino, K.
    New search for: Muraoka, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
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    Document information
    Title:

    In-situ infrared reflective absorption spectroscopy characterization of SiN films deposited using sputtering-type ECR microwave plasma

    Contributors:

    Liu, Y. C. (author) / Furukawa, K. (author) / Gao, D. W. (author) / Nakashima, H. (author) / Uchino, K. (author) / Muraoka, K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 121/122 ; 233-236

    Publication date:

    1997-01-01

    Size:

    4 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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