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In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma
In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma
In situ FT-IR reflective absorption spectroscopy for characterization of SiO~2 thin films deposited using sputtering-type electron cyclotron resonance microwave plasma
Furukawa, K. (author) / Liu, Y. (author) / Gao, D. (author) / Nakashima, H. (author) / Uchino, K. (author) / Muraoka, K. (author)
APPLIED SURFACE SCIENCE ; 121/122 ; 228-232
1997-01-01
5 pages
Article (Journal)
English
DDC:
621.35
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