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CVD Reactors for Coating Tin Thin Films onto a Tungsten Carbide Surface

Ding, P. / Yuan, W.-K.

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CVD Reactors for Coating Tin Thin Films onto a Tungsten Carbide Surface

Ding, P. / Yuan, W.-K.

CVD Reactors for Coating Tin Thin Films onto a Tungsten Carbide Surface

Ding, P. / Yuan, W.-K.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

CVD Reactors for Coating Tin Thin Films onto a Tungsten Carbide Surface

Contributors:

Ding, P. (author) / Yuan, W.-K. (author) / Low, I. M.

Published in:

Advanced Ceramic Tools for Machining Application - III ; 449-477

KEY ENGINEERING MATERIALS ; 138/140

Publication date:

1998-01-01

Size:

29 pages

ISSN:

1013-9826

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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