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    Depth Profiling of Defects in Argon Irradiated Silicon Using Positron Beam Facility at Kalpakkam

    New search for: Amarendra, G.
    New search for: Venugopal Rao, G.
    New search for: Nair, K. G. M.
    New search for: Viswanathan, B.
    New search for: Jean, Y. C.
    New search for: Eldrup, M.
    New search for: Schrader, D. M.
    New search for: West, R. N.

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    Depth Profiling of Defects in Argon Irradiated Silicon Using Positron Beam Facility at Kalpakkam

    New search for: Amarendra, G.
    New search for: Venugopal Rao, G.
    New search for: Nair, K. G. M.
    New search for: Viswanathan, B.
    New search for: Jean, Y. C.
    New search for: Eldrup, M.
    New search for: Schrader, D. M.
    New search for: West, R. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Depth Profiling of Defects in Argon Irradiated Silicon Using Positron Beam Facility at Kalpakkam

    New search for: Amarendra, G.
    New search for: Venugopal Rao, G.
    New search for: Nair, K. G. M.
    New search for: Viswanathan, B.
    New search for: Jean, Y. C.
    New search for: Eldrup, M.
    New search for: Schrader, D. M.
    New search for: West, R. N.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Title:

    Depth Profiling of Defects in Argon Irradiated Silicon Using Positron Beam Facility at Kalpakkam

    Contributors:

    Amarendra, G. (author) / Venugopal Rao, G. (author) / Nair, K. G. M. (author) / Viswanathan, B. (author) / Jean, Y. C. / Eldrup, M. / Schrader, D. M. / West, R. N.

    Published in:

    Positron Annihilation ICPA-11 ; 650-652

    MATERIALS SCIENCE FORUM ; 255/257

    Publication date:

    1997-01-01

    Size:

    3 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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