Electrical properties of TiN~x, films on p-silicon substrates obtained by reactive ion beam assisted deposition technique: Fid-Bau Portal

Electrical properties of TiN~x, films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

Narsale, A. M. / Yousuf Pyar Ali / Kothari, D. C. / Guzman, L. / Miotello, A.

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Electrical properties of TiN~x, films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

Narsale, A. M. / Yousuf Pyar Ali / Kothari, D. C. / Guzman, L. / Miotello, A.

Electrical properties of TiN~x, films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

Narsale, A. M. / Yousuf Pyar Ali / Kothari, D. C. / Guzman, L. / Miotello, A.

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Check availability in my library

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Document information

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Document information

Title:

Electrical properties of TiN~x, films on p-silicon substrates obtained by reactive ion beam assisted deposition technique

Contributors:

Narsale, A. M. (author) / Yousuf Pyar Ali (author) / Kothari, D. C. (author) / Guzman, L. (author) / Miotello, A. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 17 ; 637-640

Publication date:

1998-01-01

Size:

4 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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