Cooperative two-photon effects in chalcogenide photoresists

Sfez, B. G. / Rosenblum, G. / Kotler, Z. et al. | British Library Online Contents | 2000

Developing novel photoresists: microstructuring of triazene containing copolyester films

Hahn, Ch. / Kunz, Th. / Dahn, U. et al. | British Library Online Contents | 1998

Chemical mapping of patterned polymer photoresists by near-field infrared microscopy

Dragnea, B. / Preusser, J. / Szarko, J. M. et al. | British Library Online Contents | 2001

Preparation and Properties of Four-component Copolymers Applied in Negative-type Photoresists

Huang, H.-Y. / Chen, H. / Hsu, M.-Y. | British Library Online Contents | 2011

Thick film patterning by lift-off process using double-coated single photoresists

Fu, Y. / Ye, L. L. / Liu, J. | British Library Online Contents | 2012