In-situ poling of lithium niobate films on silicon wafer by applying a low electric field during pulsed laser deposition: Fid-Bau Portal

In-situ poling of lithium niobate films on silicon wafer by applying a low electric field during pulsed laser deposition

Guo, X. L. / Hu, W. S. / Liu, Z. G. / Zhu, S. N. / Yu, T. / Xiong, S. B. / Lin, C. Y.

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In-situ poling of lithium niobate films on silicon wafer by applying a low electric field during pulsed laser deposition

Guo, X. L. / Hu, W. S. / Liu, Z. G. / Zhu, S. N. / Yu, T. / Xiong, S. B. / Lin, C. Y.

In-situ poling of lithium niobate films on silicon wafer by applying a low electric field during pulsed laser deposition

Guo, X. L. / Hu, W. S. / Liu, Z. G. / Zhu, S. N. / Yu, T. / Xiong, S. B. / Lin, C. Y.

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Title:

In-situ poling of lithium niobate films on silicon wafer by applying a low electric field during pulsed laser deposition

Contributors:

Guo, X. L. (author) / Hu, W. S. (author) / Liu, Z. G. (author) / Zhu, S. N. (author) / Yu, T. (author) / Xiong, S. B. (author) / Lin, C. Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 53 ; 278-283

Publication date:

1998-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Preparation of (001)-oriented PZT thick films on silicon wafer by pulsed laser deposition

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