Probing of microvoids in high-rate deposited a-Si:H thin films by variable energy positron annihilation spectroscopy: Fid-Bau Portal

Probing of microvoids in high-rate deposited a-Si:H thin films by variable energy positron annihilation spectroscopy

Zou, X. / Webb, D. P. / Chan, Y. C. / Lam, Y. W. / Hu, Y. F. / Fung, S. / Beling, C. D.

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Probing of microvoids in high-rate deposited a-Si:H thin films by variable energy positron annihilation spectroscopy

Zou, X. / Webb, D. P. / Chan, Y. C. / Lam, Y. W. / Hu, Y. F. / Fung, S. / Beling, C. D.

Probing of microvoids in high-rate deposited a-Si:H thin films by variable energy positron annihilation spectroscopy

Zou, X. / Webb, D. P. / Chan, Y. C. / Lam, Y. W. / Hu, Y. F. / Fung, S. / Beling, C. D.

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Document information

Title:

Probing of microvoids in high-rate deposited a-Si:H thin films by variable energy positron annihilation spectroscopy

Contributors:

Zou, X. (author) / Webb, D. P. (author) / Chan, Y. C. (author) / Lam, Y. W. (author) / Hu, Y. F. (author) / Fung, S. (author) / Beling, C. D. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 13 ; 2833-2840

Publication date:

1998-01-01

Size:

8 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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