Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H~2 process I. Adsorption of CuCl on Cu(111): Fid-Bau Portal

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H~2 process I. Adsorption of CuCl on Cu(111)

Maartensson, P. / Larsson, K. / Carlsson, J.-O.

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Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H~2 process I. Adsorption of CuCl on Cu(111)

Maartensson, P. / Larsson, K. / Carlsson, J.-O.

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H~2 process I. Adsorption of CuCl on Cu(111)

Maartensson, P. / Larsson, K. / Carlsson, J.-O.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H~2 process I. Adsorption of CuCl on Cu(111)

Contributors:

Maartensson, P. (author) / Larsson, K. (author) / Carlsson, J.-O. (author)

Published in:

APPLIED SURFACE SCIENCE ; 136 ; 137-146

Publication date:

1998-01-01

Size:

10 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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