Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H"2 process

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H"2 process - II. Reaction energies

Martensson, P. / Larsson, K. / Carlsson, J.-O.

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Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H"2 process - II. Reaction energies

Martensson, P. / Larsson, K. / Carlsson, J.-O.

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H"2 process - II. Reaction energies

Martensson, P. / Larsson, K. / Carlsson, J.-O.

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Title:

Atomic layer epitaxy of copper: an ab initio investigation of the CuCl/H"2 process - II. Reaction energies

Contributors:

Martensson, P. (author) / Larsson, K. (author) / Carlsson, J.-O. (author)

Published in:

APPLIED SURFACE SCIENCE ; 148 ; 9-16

Publication date:

1999-01-01

Size:

8 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

Martensson, P. / Larsson, K. / Carlsson, J. O. | British Library Online Contents | 2000

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