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Effect of stress on silicide formation kinetics in thin film titanium - selicon system
Effect of stress on silicide formation kinetics in thin film titanium - selicon system
Effect of stress on silicide formation kinetics in thin film titanium - selicon system
Nagabushnam, R. V. (author) / Singh, R. K. (author) / Sharan, S. (author) / Slaoui, A. / Singh, R. K. / Theiler, T. / Muller, J. C.
1998-01-01
8 pages
Article (Journal)
English
DDC:
621.38152
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