Interdiffusion and diffusion structure development in selected refractory metal silicides: Fid-Bau Portal

Interdiffusion and diffusion structure development in selected refractory metal silicides

Tortorici, P. C. / Dayananda, M. A.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Interdiffusion and diffusion structure development in selected refractory metal silicides

Tortorici, P. C. / Dayananda, M. A.

Interdiffusion and diffusion structure development in selected refractory metal silicides

Tortorici, P. C. / Dayananda, M. A.

Access

Access via TIB

Check availability in my library

Order at Subito €

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

Interdiffusion and diffusion structure development in selected refractory metal silicides

Contributors:

Tortorici, P. C. (author) / Dayananda, M. A. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- A ; 261 ; 64-77

Publication date:

1999-01-01

Size:

14 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

Gas, P. | British Library Online Contents | 1994

Interdiffusion and Stress Development in Thin Film Diffusion Couples

Kuru, Y. / Chakraborty, J. / Welzel, U. et al. | British Library Online Contents | 2006

Semiconducting Silicides

Borisenko, Victor E. | TIBKAT | 2000

Self-diffusion and interdiffusion in intermetallic compounds

Nakajima, H. / Nonaka, K. / Sprengel, W. et al. | British Library Online Contents | 1997

Chemical vapour deposition precursors for metal silicides

Madar, R. / Thomas, N. / Bernard, C. | British Library Online Contents | 1993