Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution: Fid-Bau Portal

Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

Hsiao, H.L. / Hwang, H.L. / Yang, A.B. / Chen, L.W. / Yew, T.R.

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Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

Hsiao, H.L. / Hwang, H.L. / Yang, A.B. / Chen, L.W. / Yew, T.R.

Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

Hsiao, H.L. / Hwang, H.L. / Yang, A.B. / Chen, L.W. / Yew, T.R.

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Check availability in my library

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Document information

Title:

Study on low temperature facetting growth of polycrystalline silicon thin films by ECR downstream plasma CVD with different hydrogen dilution

Contributors:

Hsiao, H.L. (author) / Hwang, H.L. (author) / Yang, A.B. (author) / Chen, L.W. (author) / Yew, T.R. (author)

Published in:

APPLIED SURFACE SCIENCE ; 142 ; 316-321

Publication date:

1999-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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