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Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum

Majamaa, T. / Kilpela, O. / Novikov, S. / Sinkkonen, J.

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Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum

Majamaa, T. / Kilpela, O. / Novikov, S. / Sinkkonen, J.

Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum

Majamaa, T. / Kilpela, O. / Novikov, S. / Sinkkonen, J.

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Order at Subito €

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Document information

Title:

Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum

Contributors:

Majamaa, T. (author) / Kilpela, O. (author) / Novikov, S. (author) / Sinkkonen, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 142 ; 351-355

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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