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    Fabrication and analysis of the nanometer-sized structure of silicon by ultrahigh vacuum field emission transmission electron microscope

    New search for: Takeguchi, M.
    New search for: Tanaka, M.
    New search for: Furuya, K.

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    Fabrication and analysis of the nanometer-sized structure of silicon by ultrahigh vacuum field emission transmission electron microscope

    New search for: Takeguchi, M.
    New search for: Tanaka, M.
    New search for: Furuya, K.

    Access

    Access via TIB
    Check availability in my library
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    Fabrication and analysis of the nanometer-sized structure of silicon by ultrahigh vacuum field emission transmission electron microscope

    New search for: Takeguchi, M.
    New search for: Tanaka, M.
    New search for: Furuya, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Fabrication and analysis of the nanometer-sized structure of silicon by ultrahigh vacuum field emission transmission electron microscope

    Contributors:

    Takeguchi, M. (author) / Tanaka, M. (author) / Furuya, K. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 146 ; 257-261

    Publication date:

    1999-01-01

    Size:

    5 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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