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    Low-temperature deposition of titanium nitride films from dialkylhydrazine-based precursors

    New search for: Scheper, J.T.
    New search for: McKarns, P.J.
    New search for: Lewkebandara, T.S.
    New search for: Winter, C.H.

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    Low-temperature deposition of titanium nitride films from dialkylhydrazine-based precursors

    New search for: Scheper, J.T.
    New search for: McKarns, P.J.
    New search for: Lewkebandara, T.S.
    New search for: Winter, C.H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Low-temperature deposition of titanium nitride films from dialkylhydrazine-based precursors

    New search for: Scheper, J.T.
    New search for: McKarns, P.J.
    New search for: Lewkebandara, T.S.
    New search for: Winter, C.H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Low-temperature deposition of titanium nitride films from dialkylhydrazine-based precursors

    Contributors:

    Scheper, J.T. (author) / McKarns, P.J. (author) / Lewkebandara, T.S. (author) / Winter, C.H. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 2 ; 149-157

    Publication date:

    1999-01-01

    Size:

    9 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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