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    Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams

    New search for: Sohn, M. H.
    New search for: Kim, S. I.
    New search for: Siangchaew, K.

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    Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams

    New search for: Sohn, M. H.
    New search for: Kim, S. I.
    New search for: Siangchaew, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams

    New search for: Sohn, M. H.
    New search for: Kim, S. I.
    New search for: Siangchaew, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
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    Document information
    Title:

    Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams

    Contributors:

    Sohn, M. H. (author) / Kim, S. I. (author) / Siangchaew, K. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 3221-3225

    Publication date:

    1999-01-01

    Size:

    5 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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