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Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams
Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams
Studies of electron energy loss near edge structure at the interface between Si and amorphous carbon films deposited by direct carbon ion beams
Sohn, M. H. (Autor:in) / Kim, S. I. (Autor:in) / Siangchaew, K. (Autor:in)
JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 3221-3225
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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