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Beryllium Implantation Doping of Silicon Carbide

Henkel, T. / Tanaka, Y. / Kobayashi, N. / Nishizawa, S. / Hishita, S.

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Beryllium Implantation Doping of Silicon Carbide

Henkel, T. / Tanaka, Y. / Kobayashi, N. / Nishizawa, S. / Hishita, S.

Beryllium Implantation Doping of Silicon Carbide

Henkel, T. / Tanaka, Y. / Kobayashi, N. / Nishizawa, S. / Hishita, S.

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Document information

Title:

Beryllium Implantation Doping of Silicon Carbide

Contributors:

Henkel, T. (author) / Tanaka, Y. (author) / Kobayashi, N. (author) / Nishizawa, S. (author) / Hishita, S. (author)

Published in:

MATERIALS SCIENCE FORUM ; 338/342 ; 953-956

Publication date:

2000-01-01

Size:

4 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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