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    Multiply-charged ion beam induced dry etching of semiconductor materials

    New search for: Meguro, T.
    New search for: Sakamoto, M.
    New search for: Takai, H.
    New search for: Aoyagi, Y.

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    Multiply-charged ion beam induced dry etching of semiconductor materials

    New search for: Meguro, T.
    New search for: Sakamoto, M.
    New search for: Takai, H.
    New search for: Aoyagi, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Multiply-charged ion beam induced dry etching of semiconductor materials

    New search for: Meguro, T.
    New search for: Sakamoto, M.
    New search for: Takai, H.
    New search for: Aoyagi, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Multiply-charged ion beam induced dry etching of semiconductor materials

    Contributors:

    Meguro, T. (author) / Sakamoto, M. (author) / Takai, H. (author) / Aoyagi, Y. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 74 ; 40 - 44

    Publication date:

    2000-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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