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Residual stresses in chemical vapor deposition free-standing diamond films by X-ray diffraction analyses

Durand, O. / Bisaro, R. / Brierley, C. J. / Galtier, P. / Kennedy, G. R. / Kruger, J. K. / Olivier, J.

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Residual stresses in chemical vapor deposition free-standing diamond films by X-ray diffraction analyses

Durand, O. / Bisaro, R. / Brierley, C. J. / Galtier, P. / Kennedy, G. R. / Kruger, J. K. / Olivier, J.

Residual stresses in chemical vapor deposition free-standing diamond films by X-ray diffraction analyses

Durand, O. / Bisaro, R. / Brierley, C. J. / Galtier, P. / Kennedy, G. R. / Kruger, J. K. / Olivier, J.

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Document information

Title:

Residual stresses in chemical vapor deposition free-standing diamond films by X-ray diffraction analyses

Contributors:

Durand, O. (author) / Bisaro, R. (author) / Brierley, C. J. (author) / Galtier, P. (author) / Kennedy, G. R. (author) / Kruger, J. K. (author) / Olivier, J. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- A ; 288 ; 217 - 222

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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