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    Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature

    New search for: Terzini, E.
    New search for: Thilakan, P.
    New search for: Minarini, C.

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    Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature

    New search for: Terzini, E.
    New search for: Thilakan, P.
    New search for: Minarini, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature

    New search for: Terzini, E.
    New search for: Thilakan, P.
    New search for: Minarini, C.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Properties of ITO thin films deposited by RF magnetron sputtering at elevated substrate temperature

    Contributors:

    Terzini, E. (author) / Thilakan, P. (author) / Minarini, C. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 77 ; 110 - 114

    Publication date:

    2000-01-01

    Size:

    5 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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