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Properties of Si/Mo Thin Films Deposited by Magnetron Sputtering Method

Maoguo, Z. / Hua, C.

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Properties of Si/Mo Thin Films Deposited by Magnetron Sputtering Method

Maoguo, Z. / Hua, C.

Properties of Si/Mo Thin Films Deposited by Magnetron Sputtering Method

Maoguo, Z. / Hua, C.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Properties of Si/Mo Thin Films Deposited by Magnetron Sputtering Method

Contributors:

Maoguo, Z. (author) / Hua, C. (author)

Published in:

RARE METAL MATERIALS AND ENGINEERING ; 34 ; 1158-1161

Publication date:

2005-01-01

Size:

4 pages

ISSN:

1002-185X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 669

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