Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant: Fid-Bau Portal

Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant

Amato-Wierda, C. / Wierda, D. A.

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Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant

Amato-Wierda, C. / Wierda, D. A.

Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant

Amato-Wierda, C. / Wierda, D. A.

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Document information

Title:

Chemical vapor deposition of titanium nitride thin films from tetrakis(dimethylamido)titanium and hydrazine as a coreactant

Contributors:

Amato-Wierda, C. (author) / Wierda, D. A. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 15 ; 2414-2424

Publication date:

2000-01-01

Size:

11 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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