Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

    New search for: Arvan, B.
    New search for: Khakifirooz, A.
    New search for: Tarighat, R.
    New search for: Mohajerzadeh, S.
    New search for: Goodarzi, A.
    New search for: Soleimani, E. A.
    New search for: Arzi, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

    New search for: Arvan, B.
    New search for: Khakifirooz, A.
    New search for: Tarighat, R.
    New search for: Mohajerzadeh, S.
    New search for: Goodarzi, A.
    New search for: Soleimani, E. A.
    New search for: Arzi, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

    New search for: Arvan, B.
    New search for: Khakifirooz, A.
    New search for: Tarighat, R.
    New search for: Mohajerzadeh, S.
    New search for: Goodarzi, A.
    New search for: Soleimani, E. A.
    New search for: Arzi, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

    Contributors:

    Arvan, B. (author) / Khakifirooz, A. (author) / Tarighat, R. (author) / Mohajerzadeh, S. (author) / Goodarzi, A. (author) / Soleimani, E. A. (author) / Arzi, E. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 109 ; 17-23

    Publication date:

    2004-01-01

    Size:

    7 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

    Aarik, J. / Aidla, A. / Mandar, H. et al. | British Library Online Contents | 2001

    Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3

    Ramanuja, N. / Levy, R. A. / Dharmadhikari, S. N. et al. | British Library Online Contents | 2002

    Characteristics of titanium dioxide films deposited by metalorganic chemical vapor deposition

    Wang, D. / Wang, M. / Xu, X. H. et al. | British Library Online Contents | 2002

    Atmospheric pressure chemical vapor deposition of TiN from tetrakis(dimethylamido)titanium and ammonia

    Musher, J. N. / Gordon, R. G. | British Library Online Contents | 1996

    Photocatalytic anatase titanium dioxide thin films deposition by an atmospheric pressure blown arc discharge

    Boscher, N. D. / Olivier, S. / Maurau, R. et al. | British Library Online Contents | 2014

    Back to top