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    Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor

    New search for: Asmann, M.
    New search for: Cook, R. F.
    New search for: Heberlein, J. V.
    New search for: Pfender, E.

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    Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor

    New search for: Asmann, M.
    New search for: Cook, R. F.
    New search for: Heberlein, J. V.
    New search for: Pfender, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor

    New search for: Asmann, M.
    New search for: Cook, R. F.
    New search for: Heberlein, J. V.
    New search for: Pfender, E.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Chemical vapor deposition of an aluminum nitride-diamond composite in a triple torch plasma reactor

    Contributors:

    Asmann, M. (author) / Cook, R. F. (author) / Heberlein, J. V. (author) / Pfender, E. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 16 ; 469-477

    Publication date:

    2001-01-01

    Size:

    9 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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