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Growth and characterization of CoSi2 films on Si (100) substrates

Takahashi, F. / Irie, T. / Shi, J. / Hashimoto, M.

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Growth and characterization of CoSi2 films on Si (100) substrates

Takahashi, F. / Irie, T. / Shi, J. / Hashimoto, M.

Growth and characterization of CoSi2 films on Si (100) substrates

Takahashi, F. / Irie, T. / Shi, J. / Hashimoto, M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Growth and characterization of CoSi2 films on Si (100) substrates

Contributors:

Takahashi, F. (author) / Irie, T. (author) / Shi, J. (author) / Hashimoto, M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 169-170 ; 315-319

Publication date:

2001-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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