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FT-IR-ATR study of depth profile of SiO2 ultra-thin films

Nagai, N. / Hashimoto, H.

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FT-IR-ATR study of depth profile of SiO2 ultra-thin films

Nagai, N. / Hashimoto, H.

FT-IR-ATR study of depth profile of SiO2 ultra-thin films

Nagai, N. / Hashimoto, H.

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Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

FT-IR-ATR study of depth profile of SiO2 ultra-thin films

Contributors:

Nagai, N. (author) / Hashimoto, H. (author)

Published in:

APPLIED SURFACE SCIENCE ; 172 ; 307-311

Publication date:

2001-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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