Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy: Fid-Bau Portal

Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Frammelsberger, W. / Benstetter, G. / Kiely, J. / Stamp, R.

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Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Frammelsberger, W. / Benstetter, G. / Kiely, J. / Stamp, R.

Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Frammelsberger, W. / Benstetter, G. / Kiely, J. / Stamp, R.

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Document information

Title:

Thickness determination of thin and ultra-thin SiO2 films by C-AFM IV-spectroscopy

Contributors:

Frammelsberger, W. (author) / Benstetter, G. (author) / Kiely, J. (author) / Stamp, R. (author)

Published in:

APPLIED SURFACE SCIENCE ; 252 ; 2375-2388

Publication date:

2006-01-01

Size:

14 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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