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Approaching the limit for quantitative SIMS measurement of ultra-thin nitrided SiO2 films

Novak, S. W. / Bekos, E. J. / Marino, J. W.

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Approaching the limit for quantitative SIMS measurement of ultra-thin nitrided SiO2 films

Novak, S. W. / Bekos, E. J. / Marino, J. W.

Approaching the limit for quantitative SIMS measurement of ultra-thin nitrided SiO2 films

Novak, S. W. / Bekos, E. J. / Marino, J. W.

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Order at Subito €

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Document information

Title:

Approaching the limit for quantitative SIMS measurement of ultra-thin nitrided SiO2 films

Contributors:

Novak, S. W. (author) / Bekos, E. J. (author) / Marino, J. W. (author)

Published in:

APPLIED SURFACE SCIENCE ; 175-176 ; 678-684

Publication date:

2001-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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