Fachinformationsdienst BAUdigital

A platform for research: civil engineering, architecture and urbanism

    Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172nm excimer lamp

    New search for: Zhang, J. Y.
    New search for: Dusastre, V.
    New search for: Boyd, I. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172nm excimer lamp

    New search for: Zhang, J. Y.
    New search for: Dusastre, V.
    New search for: Boyd, I. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172nm excimer lamp

    New search for: Zhang, J. Y.
    New search for: Dusastre, V.
    New search for: Boyd, I. W.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Characterisation of ultraviolet annealed tantalum oxide films deposited by photo-CVD using 172nm excimer lamp

    Contributors:

    Zhang, J. Y. (author) / Dusastre, V. (author) / Boyd, I. W. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 313-317

    Publication date:

    2001-01-01

    Size:

    5 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

    Similar titles

    Characterization of excimer lamp photo-deposited ultrathin oxynitride films [2403-24]

    Lynch, S. / O'Connor, G. M. / Crean, G. M. et al. | British Library Conference Proceedings | 1995

    Deposition and annealing of tantalum pentoxide films using 172 nm excimer lamp

    Zhang, J. Y. / Lim, B. / Boyd, I. W. | British Library Online Contents | 2000

    Probing the diffusion of vacuum ultraviolet (l=172nm) induced oxidants by nanoparticles immobilization

    Khatri, O. P. / Hatanaka, T. / Murase, K. et al. | British Library Online Contents | 2009

    Direct photo-deposition of silicon dioxide films using a xenon excimer lamp

    Bergonzo, P. / Kogelschatz, U. / Boyd, I. W. | British Library Online Contents | 1993

    Deposition of tantalum oxide films by ArF excimer laser ablation

    Nishimura, Y. / Shinkawa, A. / Ujita, H. et al. | British Library Online Contents | 1998

    Back to top