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    Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

    New search for: Iacona, F.
    New search for: Ceriola, G.
    New search for: La Via, F.

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    Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

    New search for: Iacona, F.
    New search for: Ceriola, G.
    New search for: La Via, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

    New search for: Iacona, F.
    New search for: Ceriola, G.
    New search for: La Via, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition

    Contributors:

    Iacona, F. (author) / Ceriola, G. (author) / La Via, F. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 43-46

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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