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    Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

    New search for: Jung, H.
    New search for: Kim, W. H.
    New search for: Oh, I. K.
    New search for: Lee, C. W.
    New search for: Lansalot-Matras, C.
    New search for: Lee, S. J.
    New search for: Myoung, J. M.
    New search for: Lee, H. B.
    New search for: Kim, H.

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    Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

    New search for: Jung, H.
    New search for: Kim, W. H.
    New search for: Oh, I. K.
    New search for: Lee, C. W.
    New search for: Lansalot-Matras, C.
    New search for: Lee, S. J.
    New search for: Myoung, J. M.
    New search for: Lee, H. B.
    New search for: Kim, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

    New search for: Jung, H.
    New search for: Kim, W. H.
    New search for: Oh, I. K.
    New search for: Lee, C. W.
    New search for: Lansalot-Matras, C.
    New search for: Lee, S. J.
    New search for: Myoung, J. M.
    New search for: Lee, H. B.
    New search for: Kim, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

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    Document information
    Title:

    Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

    Contributors:

    Jung, H. (author) / Kim, W. H. (author) / Oh, I. K. (author) / Lee, C. W. (author) / Lansalot-Matras, C. (author) / Lee, S. J. (author) / Myoung, J. M. (author) / Lee, H. B. (author) / Kim, H. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 51 ; 5082-5091

    Publication date:

    2016-01-01

    Size:

    10 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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