Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition
Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition
Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition
Iacona, F. (Autor:in) / Ceriola, G. (Autor:in) / La Via, F. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 43-46
01.01.2001
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2004
|Structural refinement of SnO2 thin film prepared by plasma-enhanced chemical vapor deposition
British Library Online Contents | 2003
|Plasma-enhanced chemical vapor deposition of PbTiO3 thin films
British Library Online Contents | 2000
|British Library Online Contents | 1997
|