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Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing

Baumann, F. H. / Chopp, D. L. / de le Rubia, T. D. / Gilmer, G. H. / Greene, J. E. / Huang, H. / Kodambaka, S. / O Sullivan, P. / Petrov, I.

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Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing

Baumann, F. H. / Chopp, D. L. / de le Rubia, T. D. / Gilmer, G. H. / Greene, J. E. / Huang, H. / Kodambaka, S. / O Sullivan, P. / Petrov, I.

Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing

Baumann, F. H. / Chopp, D. L. / de le Rubia, T. D. / Gilmer, G. H. / Greene, J. E. / Huang, H. / Kodambaka, S. / O Sullivan, P. / Petrov, I.

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Document information

Title:

Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing

Contributors:

Baumann, F. H. (author) / Chopp, D. L. (author) / de le Rubia, T. D. (author) / Gilmer, G. H. (author) / Greene, J. E. (author) / Huang, H. (author) / Kodambaka, S. (author) / O Sullivan, P. (author) / Petrov, I. (author)

Published in:

MRS BULLETIN- MATERIALS RESEARCH SOCIETY ; 26 ; 182-190

Publication date:

2001-01-01

Size:

9 pages

ISSN:

0883-7694

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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